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Author: Ross Birney Publisher: MDPI ISBN: 3036505121 Category : Science Languages : en Pages : 154
Book Description
Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology.
Author: Ross Birney Publisher: MDPI ISBN: 3036505121 Category : Science Languages : en Pages : 154
Book Description
Today, thin films are near-ubiquitous and are utilised in a very wide range of industrially and scientifically important areas. These include familiar everyday instances such as anti-reflective coatings on ophthalmic lenses, smartphone optics, photovoltaics, decorative, and tool coatings. A range of somewhat more exotic applications also exists, such as astronomical instrumentation (e.g., ultra-low loss dielectric mirrors and beam splitters in gravitational wave detectors, such as laser interferometer gravitational-wave observatory (LIGO)), gas sensing, medical devices and implants, and accelerator coatings (e.g., coatings for the large hadron collider (LHC), and compact linear collider (CLIC) experiments at European organization for nuclear research (CERN)). This Special Issue will provide a platform for researchers working in any area within this highly diverse field to share and exchange their latest research findings. The Special Issue contains novel studies encompassing material characterisation techniques, a range of thin-film coating deposition processes and applications of such technology.
Author: Liviu Duta Publisher: MDPI ISBN: 3036510443 Category : Medical Languages : en Pages : 224
Book Description
Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.
Author: B. M. Caruta Publisher: Nova Publishers ISBN: 9781594545177 Category : Science Languages : en Pages : 226
Book Description
The broad field of thin film technology is based first of all on the film growth processes in general. The concepts of crystal structure and defects in crystalline thin films such as grain boundaries, dislocations and vacancies are examined. The general nature of film growth from atoms equilibrating with the service, through the initial stages of growth to film coalescence and zone models is also within the scope of this book as are evaporation, sputter deposition and chemical vapour deposition. Thin films are widely used in microelectronics, chemistry and a wide array of related fields. This book offers new research in this exploding field.
Author: Krishna Seshan Publisher: William Andrew ISBN: 1437778739 Category : Science Languages : en Pages : 412
Book Description
Resumen: The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Author: Xiao-Yu Yang Publisher: John Wiley & Sons ISBN: 1119580471 Category : Science Languages : en Pages : 500
Book Description
This book provides a fundamental discussion, latest research & developments, and the future of thin films and photoenergy materials, two developing areas that have the potential to spearhead the future of industry. Photoenergy materials are expected to be a next generation key material to provide secure, safe, sustainable and affordable energy. Photoenergy devices are known to convert the sunlight into electricity. This type of devices is very much simple in design with having a major advantage with their structure as stand-alone systems to provide outputs up to megawatts. They have been applied as a power source, solar home systems, remote buildings, water pumping, megawatt scale power plants, satellites, communications, and space vehicles. With such a list of enormous applications, the demand for photoenergy devices is growing every year. On the other hand, thin films coating, which can be defined as fusion of surface science, materials science, and applied physics, are progressing as a unified discipline of scientific industry. A thin film can be termed as a very fine or thin layer of material coated on a particular surface, that can be in the range of a nanometer in thickness to several micrometers in size. Thin films are being applied it a number of fields ranging from protection purposes to electronic semiconductor devices.
Author: Sushil Kumar Publisher: Springer Nature ISBN: 9811561168 Category : Technology & Engineering Languages : en Pages : 721
Book Description
This volume comprises the expert contributions from the invited speakers at the 17th International Conference on Thin Films (ICTF 2017), held at CSIR-NPL, New Delhi, India. Thin film research has become increasingly important over the last few decades owing to the applications in latest technologies and devices. The book focuses on current advances in thin film deposition processes and characterization including thin film measurements. The chapters cover different types of thin films like metal, dielectric, organic and inorganic, and their diverse applications across transistors, resistors, capacitors, memory elements for computers, optical filters and mirrors, sensors, solar cells, LED's, transparent conducting coatings for liquid crystal display, printed circuit board, and automobile headlamp covers. This book can be a useful reference for students, researchers as well as industry professionals by providing an up-to-date knowledge on thin films and coatings.
Author: National Academy of Engineering Publisher: National Academies Press ISBN: 0309091632 Category : Science Languages : en Pages : 257
Book Description
The announcement of a hydrogen fuel initiative in the President's 2003 State of the Union speech substantially increased interest in the potential for hydrogen to play a major role in the nation's long-term energy future. Prior to that event, DOE asked the National Research Council to examine key technical issues about the hydrogen economy to assist in the development of its hydrogen R&D program. Included in the assessment were the current state of technology; future cost estimates; CO2 emissions; distribution, storage, and end use considerations; and the DOE RD&D program. The report provides an assessment of hydrogen as a fuel in the nation's future energy economy and describes a number of important challenges that must be overcome if it is to make a major energy contribution. Topics covered include the hydrogen end-use technologies, transportation, hydrogen production technologies, and transition issues for hydrogen in vehicles.
Author: Zexian Cao Publisher: Elsevier ISBN: 0857093290 Category : Technology & Engineering Languages : en Pages : 432
Book Description
Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films. Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films. With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic. Provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films Focusses on the theory and modelling of thin film growth, techniques and mechanisms used for thin film growth and properties of thin films An essential reference for engineers in electronics, energy materials and mechanical engineering
Author: Yoshio Nishi Publisher: CRC Press ISBN: 1420017667 Category : Technology & Engineering Languages : en Pages : 1720
Book Description
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Author: Ross Birney
Author: Ross Birney
Author: Liviu Duta
Author: B. M. Caruta
Author: Krishna Seshan
Author: Xiao-Yu Yang
Author: Sushil Kumar
Author: National Academy of Engineering
Author: Zexian Cao
Author: Thomas Wächtler
Author: Yoshio Nishi